Applications Example - DISCO CORPORATION
disco
Japanese Chinese Traditional Chinese Simplified Korean English
SiteMap
About Disco Investors CSR
HOMENews ReleasesSolutionsProduct InformationCustomer SupportCustomer SatisfactionContact
DISCO HOME > Solutions > Applications Example > Grinding

Solutions


Applications Example

Chip Warpage Thin Grinding
Chip warpage occurs due the stress imbalance of the pattern side (front side) and grinding side (backside). When the wafer becomes thin, chip warpage starts to become distinguished. With the recent progress of wafer thinning, chip warpage reduction is an important application.

Fig.1 shows the chip warpage amount for an eight-inch wafer ground to 0.05 mm using typical grinding conditions (chip size: 8x10 mm). It was recognized that wafers that were processed with a Dry Polisher (DP) or Plasma Etcher (PE) achieved significant reduction in chip warpage.


Fig.1 Chip warpage amount
* The graph is displayed with a logarithmic scale

Process
Length
Width
#2000
15549 (1.5549µm)
11665 (1.1665µm)
#2000+DP
919   (0.0919µm)
314  (0.0314µm)
#2000+PE
137  (0.0137µm)
19   (0.0019µm)
Poligrind
8956 (0.8956µm)
7098  (0.7098µm)
Poligrind+DP
128  (0.0128µm)
35   (0.0035µm)
Poligrind+PE
21   (0.0021µm)
26   (0.0026µm)
[Unit: Angstrom]

Measuring machine: Reflective laser measuring machine (Chapman)




Personal Information Protection Policy
User Aqreement
Contact
Copyright 2001-2010 DISCO CORPORATION All rights reserved.
Back To Top