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Applications Example

Particle countermeasure -3
Particles* that are produced during processing become difficult to remove completely if the wafer surface dries. This is because the particles bond to the wafer surface.
* Fragments such as cutting debris that are produced during processing and adhere to the wafer.

<Process Example>

Wafer surface films tend to dry fast and have a high water-repellency. DISCO has developed a product that suppresses particle adhesion for wafers with high water-repellency.
 
Photo 2 shows a wafer with aluminum film that has been processed using the developed product. Compared to Photo 1 (before product attachment), less particle adhesion is visible. (To make it easier to confirm particle removal results during processing, a wafer with aluminum film, which is susceptible to particle adhesion, was used.)
Photo.1 Before product attachment
Photo.2 After product attachment

The visible white spots on the wafer are particle adhesion.
DISCO offers optimum particle countermeasures according to the customer device and processing environment. If you are having trouble with particle adhesion, contact us at any time.


Reference Informations
About StayClean http://www.disco.co.jp/eg/news/press/20051121_3.html


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