Applications Example - DISCO CORPORATION
disco
Japanese Chinese Traditional Chinese Simplified Korean English
SiteMap
About Disco Investors CSR
HOMENews ReleasesSolutionsProduct InformationCustomer SupportCustomer SatisfactionContact
DISCO HOME > Solutions > Applications Example > Grinding

Solutions


Applications Example

Wafer damaged TEM Photo
In recent years, there has been a need to increase the strength of thinned wafers (chips). The damaged layer as a result of the grinding process largely influences the strength of the wafer. Disco carries out research and development to reduce the damage of grinding and to remove the damage layer.

Photo 1 and 2 are TEM photographs of the wafer damage layer for a silicon wafer that has been ground with a #2000 grinding wheel and a poligrind wheel respectively. Grinding with a poligrind wheel results in a lower damage layer compared to a #2000 grinding wheel (reference: Chip Strength Measurement Result - http://www.disco.co.jp/eg/products/grinding_wheel/poligrind.html). For reference, a TEM photograph of dry polished wafer is shown in Photo 3.
 Photo.1 Background (#2000)
Damage layer thickness: 0.2 µm
Photo. 2 Background (Poligrind)
Damage layer thickness: 0.1 µm
Photo. 3 Dry Polish (reference)
Photo magnification: x500000




Personal Information Protection Policy
User Aqreement
Contact
Copyright 2001-2010 DISCO CORPORATION All rights reserved.
Back To Top